Photo-assisted deposited method is often employed in the metal-organic chemical vapor deposition whose ion source is organic compounds. It has been proved to increase the deposition rate and improve the crystallinity of the films. We demonstrate a photo-assisted sputtering deposited method which is used to prepare high quality TiO₂ films. The crystallinity of the films is improved by the photo assistance without changing the morphology. And the structural and optical properties remain the same. The photo-assisted deposited TiO₂ film shows a H₂ evolution rate of 1.62 mmol·cm^-2·h^-1 that is about twice more than that of the pristine TiO₂ film. It is found the Mott-Schottky effect responds for the photocatalytic activity. Photo-assisted deposited films show an enhanced photocatalytic activity due to the reduction of interface recombination and the high efficiency in the transferring of photo-generated carriers.